4.7 Article

Substoichiometry and tantalum dependent thermal stability of α-structured W-Ta-B thin films

Journal

SCRIPTA MATERIALIA
Volume 155, Issue -, Pages 5-10

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2018.06.005

Keywords

W-Ta-B; Thin films; Boron vacancies; Density functional theory (DFT); UHTC

Funding

  1. Austrian Federal Ministry of Economy, Family and Youth
  2. National Foundation for Research, Technology and Development
  3. Plansee Composite Materials GmbH
  4. Oerlikon Balzers, Oerlikon Surface Solutions AG

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Physical vapor deposited (PVD) WB2 thin films crystallize in the alpha-AIB(2)-prototype structure rather than in their thermodynamically stable (omega-W2B5-z-prototype structure. Contrary to the majority of alpha-AlB2-type transition metal diborides (TMB2), alpha-WB2 exhibits a more ductile character. Combining density functional theory and sophisticated experiments, we show that the stability of alpha-WB2 thin films is basically influenced by point defects such as vacancies present in PVD materials. With the help of alpha-TaB2 (one of the most ductile TMB2 with high preference for alpha-AlB2-type), the thermally driven decomposition and phase transformation of alpha-W1-xTaxB2-z to the omega-W2B5-z-type can be shifted to temperatures above 1200 degrees C. (C) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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