Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 5, Pages 3323-3328Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am508197k
Keywords
directed self-assembly; block copolymers; lithography; chemo-theraphy; grapho-epitaxy; top coats
Funding
- Nissan Chemical Industries
- Lam Research
- ASTC
- National Science Foundation [EECS-1120823, EEC-1160494]
- IBM Ph.D. Fellowship Program
- National Science Foundation Graduate Research Fellowship [DGE-1110007]
- Paul D. Meek Endowed Graduate Fellowship in Engineering
- Virginia Jr. Fellowship in Engineering
- Ernest Cockrell Jr. Fellowship in Engineering
- Welch Foundation [F-1709, F-1830]
- Rashid Engineering Regents Chair
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1120823] Funding Source: National Science Foundation
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The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L-0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6x and trench space subdivisions up to 7 x, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
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