Journal
PHYSICA B-CONDENSED MATTER
Volume 535, Issue -, Pages 119-123Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.physb.2017.06.075
Keywords
NiO thin film; ZnO nanorods; Chemical bath deposition; Heterojunction; Electron-blocking layer
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Funding
- SA Research Chairs Initiative of the Department of Science and Technology
- SA Research Chairs Initiative of the National Research Foundation, South Africa
- Nelson Mandela Metropolitan University, South Africa
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In this paper, the growth of ZnO nanorods on bare and NiO-coated p-Si substrates is reported. A two-step chemical bath deposition process has been used to grow the nanorods. X-ray diffraction and scanning probe microscopy confirmed that the NiO films were polycrystalline, and that the average grain size correlated with the NiO layer thickness. The ZnO nanorod morphology, orientation and optical properties seemed to be unaffected by the intermediate NiO layer thickness. Current-voltage measurements confirmed the rectifying behavior of all the ZnO/NiO/Si heterostructures. The inclusion of a NiO layer between the substrate and the ZnO nanorods are shown to cause a reduction in both the forward and reverse bias currents. This is in qualitative agreement with the band diagram of these heterostructures, which suggests that the intermediate NiO layer should act as an electron blocking layer.
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