Journal
PHYSICA B-CONDENSED MATTER
Volume 535, Issue -, Pages 96-98Publisher
ELSEVIER
DOI: 10.1016/j.physb.2017.06.064
Keywords
GaN; Cs implantation; Defect; DLTS
Categories
Funding
- National Research Foundation of South Africa [98961]
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Deep level transient spectroscopy (DLTS) was used to characterise Cs implanted GaN grown by hydride vapour phase epitaxy (HVPE). This implantation was done at room temperature using energy of 360 keV to a fluence of 10(-11) cm(-2). A defect with activation energy of 0.19 eV below the conduction band and an apparent capture cross section of 1.1 x 10(-15) cm(2) was induced. This defect has previously been observed after rare earth element (Eu, Er and Pr) implantation. It has also been reported after electron, proton and He ion implantation.
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