Journal
OPTICS EXPRESS
Volume 21, Issue 12, Pages 14763-14770Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.21.014763
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Funding
- Danish research council [09-065929]
- innovation consortium GENIUS
- EU [248 236]
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A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes. (C) 2013 Optical Society of America
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