Journal
OPTICS LETTERS
Volume 43, Issue 2, Pages 206-209Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.43.000206
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Funding
- National Natural Science Foundation of China (NSFC) [51375400, 51622509]
- Specific Project for the National Excellent Doctorial Dissertations [201430]
- Fundamental Research Funds for the Central Universities [3102017jg02007]
- 111 Project [B13044]
- Innovation Foundation for Doctor Dissertation of Northwestern Polytechnical University [CX201606]
- Seed Foundation of Innovation and Creation for Graduate Students in Northwestern Polytechnical University [Z2017013]
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Slit arrays based on noble metals have been widely proposed as planar transverse-magnetic (TM)-lenses, illuminated by a linearly polarized light with the polarization perpendicular to slits and implementing the focusing capability beyond the diffraction limit. However, due to intrinsic plasmonic losses, these TM-lenses cannot work efficiently in the ultraviolet wavelengths. In this Letter, taking advantage of the unique transmission through metallic slits not involving plasmonic losses, a metallic slit array with transverse-electric (TE)-polarized design is proposed, showing for the first time, to the best of our knowledge, the realization of sub-diffraction-limit focusing for ultraviolet light. Additionally, in contrast to the situations of TM-lenses, a wider slit leads to a greater phase delay and much larger slits can be arranged to construct the TE-lenses, which is quite beneficial for practical fabrication. Furthermore, deep-subwavelength focusing can be achieved by utilizing the immersing technology. (C) 2018 Optical Society of America
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