Journal
NANOTECHNOLOGY
Volume 29, Issue 29, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/1361-6528/aac230
Keywords
ZnO; Schottky diode; NiO; secondary ion mass spectroscopy
Funding
- Ministry of Science and Technology of the Republic of China, Taiwan [MOST 105-2112-M-415-001-MY3]
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The rectifying characteristic of Au/ZnO Schottky diodes (SDs) was remarkably improved by introducing a NiO layer in-between the Au and ZnO layers. Compared with the Au/ZnO SDs, the introduction of the NiO layer significantly enhanced the rectification ratio from 1.38 to 1300, and reduced the ideality factor from 5.78 to 2.14. The NiO and ZnO layers were deposited on an indium-tin-oxide/glass substrate by radio-frequency magnetron sputtering. Secondary ion mass spectroscopy showed that Ni atoms diffused from NiO to ZnO, leading to a graded distribution of Ni in ZnO. X-ray diffraction demonstrated that the diffusion of Ni atoms increased the grain size and electron concentration of ZnO. X-ray photoelectron spectroscopy showed that the interstitial oxygen (O-i) atoms in NiO and ZnO compensated the oxygen vacancies (O-v) at the NiO/ZnO interface; the amount of O-v was significantly reduced, while O-i vanished at the interface. The band diagram revealed a potential drop in the bulk ZnO, owing to the graded distribution of Ni in ZnO, which accelerated the carriers, collected by the outer circuit. The carriers at the NiO/ZnO interface easily crossed over the barrier height, instead of being recombined by O-v, owing to the lower amount of O-v at the interface.
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