4.8 Article

Unipolar n-Type Black Phosphorus Transistors with Low Work Function Contacts

Journal

NANO LETTERS
Volume 18, Issue 5, Pages 2822-2827

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b05192

Keywords

Black phosphorus; scandium contact; erbium contact; low work function; transistors

Funding

  1. FAME (Function Accelerated nanoMaterial Engineering)
  2. STARnet
  3. MARCO
  4. DARPA
  5. National Science Foundation (NSF) EFRI 2-DARE Award [1542883]
  6. Air Force Office of Scientific Research (AFOSR) Grant [FA9550-14-1-0251]
  7. NSF as part of the National Nanotechnology Coordinated Infrastructure [ECCS-1542152]
  8. Emerging Frontiers & Multidisciplinary Activities
  9. Directorate For Engineering [1542883] Funding Source: National Science Foundation

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Black phosphorus (BP) is a promising two-dimensional (2D) material for nanoscale transistors, due to its expected higher mobility than other 2D semiconductors. While most studies have reported ambipolar BP with a stronger p-type transport, it is important to fabricate both unipolar p- and n-type transistors for low-power digital circuits. Here, we report unipolar n-type BP transistors with low work function Sc and Er contacts, demonstrating a record high n-type current of 200 mu A/ mu m in 6.5 nm thick BP. Intriguingly, the electrical transport of the as-fabricated, capped devices changes from ambipolar to n-type unipolar behavior after a month at room temperature. Transmission electron microscopy analysis of the contact cross-section reveals an intermixing layer consisting of partly oxidized metal at the interface. This intermixing layer results in a low n-type Schottky barrier between Sc and BP, leading to the unipolar behavior of the BP transistor. This unipolar transport with a suppressed p-type current is favorable for digital logic circuits to ensure a lower off-power consumption.

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