Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 36, Issue 1, Pages -Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.5003356
Keywords
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Funding
- German Federal Ministry of Education and Research (BMBF) [03IN2V4A, 03IN2V4B]
- German Federal Ministry for Economic Affairs and Energy (BMWi, ZIM) [16KN033522]
- GRS-Cluster FuSion of BTU
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The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino) titanium and nitrogen plasma, and the film is characterized by Arthorn ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation. Published by the AVS.
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