4.6 Article

Growth and characterisation of ferromagnetic and antiferromagnetic Fe2+xVyAI Heusler alloy films

Journal

JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 51, Issue 32, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6463/aacf4c

Keywords

Heusler alloys; spintronics; sputtering; x-ray diffraction; Fe(2)VAI; antiferromagnet; exchange bias

Funding

  1. EU-FP7 HARFIR [NMP3-SL-2013-604398]
  2. UK EPSRC [EP/M02458X/1]
  3. EPSRC [EP/M02458X/1] Funding Source: UKRI

Ask authors/readers for more resources

We investigated growth, annealing conditions and magnetic properties of the Heusler alloy Fe2+xVyAl by means of x-ray diffraction, magnetic hysteresis and exchange-bias measurements. Ferromagnetic Heusler alloy films were obtained by sputtering Fe2VAl and Fe3VAl targets and performing post-growth annealing. The characteristic (220) Heusler alloy peaks were seen in the x-ray diffraction measurements and corresponding ferromagnetic behaviours were observed. In addition, antiferromagnetic Heusler alloy films were deposited by employing Al pegs on Fe3VAl sputtering targets. The deposited films had elemental ratios close to the predicted Fe2.5V0.5Al phase, and a 16 Oe exchange-bias was measured in a Fe2.3V0.7Al/Co60Fe40 system at 100K.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available