Journal
JOURNAL OF NUCLEAR MATERIALS
Volume 498, Issue -, Pages 89-102Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jnucmat.2017.10.024
Keywords
Ferritic-martensitic (F/M) steel; Supercritical water (SCW); Temperature; Dissolved oxygen; Stress corrosion cracking
Funding
- Shanghai Key Laboratory for R&D and Application of Metallic Functional Materials in Tongji University
- Corrosion Laboratory for Nuclear Power Materials in Shanghai Jiao Tong University
- Corrosion and Materials Chemistry Research Laboratory in Georgia Institute of Technology
- Jiangsu Key Laboratory of Advanced Structural Materials and Application Technology in Nanjing Institute of Technology
- National Natural Science Foundation of China [50871076]
- International Exchange Program for Graduate Students, Tongji University [2016020004]
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The effect of temperature and dissolved oxygen (DO) on stress corrosion cracking (SCC) of P92 martensitic steel in supercritical water (SCW) was investigated using slow strain rate test (SSRT) and fractography analysis. The SSRT was carried out at temperatures of 400, 500, 600 degrees C in deaerated supercritical water and at DO contents of 0, 200, 500 ppb at the temperature of 600 degrees C, respectively. The results of SSRT show that the decrease of ductility at the temperature of 400 degrees C may be related to the dynamic strain aging (DSA) of P92 steel. The degradation of the mechanical properties in SCW is the joint effect of temperature and SCC. Compared with the effect of temperature, DO in SCW has no significant effect on the SCC susceptibility of P92 steel. The observation of oxide layer shows that large numbers of pores are nucleated in the oxide layer, which is related to vacancy accumulation and hydrogen generated in the oxide layer. Under the combined action of the growth stress and tensile stress, micro cracks, nucleated from the pores in the oxide layer, are easily propagated intergranularly outward to the surface of specimen, and fewer cracks can extend inward along the intrinsic pores to the inner oxide/metal interface, which is the reason for the exfoliation of oxide films. (c) 2017 Elsevier B.V. All rights reserved.
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