Journal
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
Volume 224, Issue -, Pages 17-22Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.elspec.2017.09.009
Keywords
High-resolution X-ray photoelectron spectroscopy; XPS; Si/Nb/Si; NbSi; Depth profiling
Categories
Funding
- EAgLE project [316014]
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Ultrathin Si/Nb/Si trilayer is an excellent example of a system for which dimensionality effects, together with other factors like type of a substrate material and growth method, influence strongly its superconducting properties. This study offers some important insights into experimental investigation of density of states of such a system with the aim to identify an electronic structure of the interface as a function of niobium layer thickness. For that, two Si/Nb/Si trilayers with 9.5 and 1.3 nm thick niobium layer buried in amorphous silicon were studied using high-resolution (HR) XPS depth-profile techniques. Strong influence of sputtering was observed, which resulted in severe intermixture of Si and Nb atoms. Nevertheless, a sharp top interface and metallic phase of niobium were detected for the thicker layer sample. On the contrary, a Nb-rich mixed alloy at top interface was observed for the thinner layer sample. (C) 2017 Elsevier B.V. All rights reserved.
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