Journal
JOURNAL OF CONTEMPORARY PHYSICS-ARMENIAN ACADEMY OF SCIENCES
Volume 53, Issue 1, Pages 58-64Publisher
ALLERTON PRESS INC
DOI: 10.3103/S1068337218010073
Keywords
memristor; resistive memory; ZnO thin film
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The structure of Au/Li10ZnO/Li1ZnO/LaB6 consisting of upper Au and lower LaB6 ohmic electrodes and a p-n junction p-Li10ZnO/n-Li1ZnO, which has the resistive memory where two functions are simultaneously combined, that is, an address access and the process of reading and storing of information is investigated. The resistance ratio (R (reset)/R (set) = 10), the data storage time (> 3 hours) and the number of switching cycles (> 350) are improved as compared to the corresponding single-layer structures. The resistive memory is explained by the modulation effect of the Li10ZnO layer, the ferroelectric polarization of which, depending on the orientation, changes the width and height of the barrier of the p-n junction formed at the p-Li10ZnO/n-Li1ZnO contact.
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