4.3 Article

Measurements of the band alignment at coherent α-Ga2O3/Al2O3 heterojunctions

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 8, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.7567/JJAP.57.080308

Keywords

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Funding

  1. JSPS [16K13673]
  2. Kyushu Synchrotron Light Research Center [1712123F]
  3. Grants-in-Aid for Scientific Research [16K13673] Funding Source: KAKEN

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The band alignment at a coherent alpha-Ga2O3/Al2O3 heterointerface was evaluated by analyzing X-ray photoemission spectra for an alpha-Al2O3 film and an alpha-Ga2O3/Al2O3 multi-quantum wells grown coherently on sapphire substrates. The measured bandgaps of alpha-Ga2O3 and alpha-Al2O3 were 5.7 and 8.7 eV, and the conduction- and valence-band offsets were 2.7 and 0.3 eV, respectively. The smaller valence-band offset is attributed the large contribution of localized O 2p orbitals at the top of the valance band in the oxides. These results complete our understanding of the band alignment of the alpha-(AlxGa1-x)(2)O-3 system in conjunction with the previously reported band offsets at alpha-Ga2O3/(AlxGa1-x)(2)O-3 heterojunctions (0.1 <= x <= 0.8). (C) 2018 The Japan Society of Applied Physics

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