Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 9, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/JJAP.57.0902B7
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Funding
- Mazda Foundation
- Casio Science Promotion Foundation
- JST/PRESTO [JPMJPR152C, 15655293]
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(Bi1-xBax)FeO3 multiferroic thin films with ferromagnetism and ferroelectricity were fabricated by a pulsed DC reactive sputtering and applied to create a magnetic domain using an electric field. The (001)-oriented (Bi1-xBax)FeO3 thin films, the electric polarization direction of which is perpendicular to the film plane, were fabricated onto a non-single-crystalline substrate with a Ta seedlayer/(111)-oriented Pt underlayer. A low pulse frequency (long time for sputtering OFF) and a high sputtering power (high-energy deposition) were effective for the acceleration of the crystallization of the (Bi1-xBax)FeO3 phase owing to the enhancement of the surface diffusion of sputtered atoms on the substrate surface. The saturation magnetization of the film was approximately 90 emu/cm(3) and the coercivity was approximately 2.5 kOe. Magnetic force microscopy analysis of the (Bi0.48Ba0.52)FeO3 film confirmed that the magnetization was generated by applying only a local electric field. The multiferroic film described here is expected to be useful for electric-field-driven magnetic devices. (C) 2018 The Japan Society of Applied Physics
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