Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 4, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/JJAP.57.04FK05
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Funding
- National Natural Science Foundation of China [51402044, 51772044]
- Program for Cooperation of Industry, Education and Academy of Guangdong Province, China [2013B090400001]
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Y128- and Y36-cut single-crystalline lithium niobate (LN) thin films are fabricated by the crystal-ion-slicing (CIS) technique onto LN substrates. The conditions for the successful exfoliation of submicron-thick LN thin films are independent of the wafer orientation used in the present work. Wafer bonding using benzocyclobutene (BCB) is adopted to transfer LN thin films onto substrates, instead of the generally used hydrophilic bonding, which does not need a strict surface polishing process before the bonding. A noncontact polishing method involving low-energy Ar+ irradiation is adopted to treat the sliced LN thin films. The atomic force microscopy result shows that the surface roughness of the LN thin film is reduced from 10.6 to 6.4 nm. (c) 2018 The Japan Society of Applied Physics.
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