4.7 Article

Photon-Assisted Ultra-Selective Formaldehyde Sensing by Defect Induced NiO-Based Resistive Sensor

Journal

IEEE SENSORS JOURNAL
Volume 18, Issue 14, Pages 5656-5661

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JSEN.2018.2839967

Keywords

Formaldehyde sensor; IAQ; photon assisted; nickel oxide; hierarchical nanostructure

Ask authors/readers for more resources

Indoor air quality (IAQ) monitoring is essential to maintain healthy human life. Among different pollutants affecting IAQ, formaldehyde is one of the toxic volatile organic compounds (VOC) that needs to be monitored. In this paper, hierarchical NiO nanostructure sensing layer was used as highly sensitive formaldehyde sensor in the presence of light. The response was found to be 292% in the presence of 190 ppm formaldehyde with a fast response similar to 24 s and recovery similar to 42 s time. The sensor was found to be highly specific towards formaldehyde compared to other VOCs. The LOD calculated for the sensor was as low as 910 ppb. The optimum operating temperature was found to be similar to 300 degrees C, much less than the conventional NiO-based sensors (similar to 600 degrees C). The sensing layer was found to be optically active due to the induced defects in the NiO nanostructure. Thus, the fabricated light-assisted sensor shows potential for future commercial formaldehyde sensor.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available