Journal
IEEE PHOTONICS TECHNOLOGY LETTERS
Volume 30, Issue 4, Pages 355-358Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2018.2790045
Keywords
Complementary metal-oxide-semiconductor (CMOS); photonic integrated circuits (PICs); frequency continuum; nonlinear optics; silicon-nitride-on-insulator (SiNOI)
Funding
- Institut Universitaire de France
- European ERC Project GRAPHICS [648546]
- European Research Council (ERC) [648546] Funding Source: European Research Council (ERC)
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We report on the fabrication and testing of silicon-nitride-on-insulator nonlinear photonic circuits for complementary metal-oxide-semiconductor (CMOS) compatible monolithic co-integration with silicon-based optoelectronics. In particular, a process has been developed to fabricate low-loss crack-free Si3N4 730-nm-thick films for Kerr-based nonlinear functions featuring full process compatibility with existing silicon photonics and front-end Si optoelectronics. Experimental evidence shows that 2.1-cm-long nanowires based on such crack-free silicon nitride films are capable of generating a frequency continuum spanning 1515-1575 nm via self-phase modulation. This work paves the way to time-stable power-efficient Kerr-based broadband sources featuring full process compatibility with Si photonic integrated circuits on CMOS lines.
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