4.3 Article Proceedings Paper

Ultrafast Electron-Phonon Coupling at Metal-Dielectric Interface

Journal

HEAT TRANSFER ENGINEERING
Volume 40, Issue 13-14, Pages 1211-1219

Publisher

TAYLOR & FRANCIS INC
DOI: 10.1080/01457632.2018.1457281

Keywords

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Funding

  1. DARPA MESO [N66001-11-1-4107]
  2. department of Energy [DE-EE0005432]
  3. National Science Foundation [1462622-CMMI]

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Energy transfer from photo-excited electrons in a metal thin film to the dielectric substrate is important for understanding the ultrafast heat transfer process across the two materials. Substantial research has been conducted to investigate heat transfer in a metal-dielectric structure. In this work, a two-temperature model in metal was used to analyze the interface electron and dielectric substrate coupling. An improved temperature and wavelength-dependent Drude-Lorentz model was implemented to interpret the signals obtained in optical measurements. Ultrafast pump-and-probe measurements on Au-Si samples were carried out, where the probe photon energy was chosen to be close to the interband transition threshold of gold to minimize the influence of non-equilibrium electrons on the optical response and maximize the thermal modulation to the optical reflectance. Electron-substrate interface thermal conductance at different pump laser fluences was obtained, and was found to increase with the interface temperature.

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