Journal
APPLIED OPTICS
Volume 54, Issue 19, Pages 5897-5902Publisher
OPTICAL SOC AMER
DOI: 10.1364/AO.54.005897
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Funding
- Air Force Office of Scientific Research (AFOSR) [95501410196]
- Engineering and Physical Sciences Research Council (EPSRC)
- Natural Sciences and Engineering Research Council of Canada (Conseil de Recherches en Sciences Naturelles et en Genie du Canada)
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Theoretical modeling and numerical simulation have been performed at lambda = 2100 nm on silicon-on-insulator channel-waveguide directional couplers in which the outer two Si waveguides are passive and the central waveguide(s) are electro-optical (EO) islands. The EO channel(s) utilize a 10 nm layer of Ge2Sb2Te5 phase-change-material sited at midlevel of a doped Si channel. A voltage-driven phase change produces a large change in the effective index of the TEo and TMo modes, thereby inducing crossbar 2 x 2 switching. A mode-matching method is employed to estimate EO switching performance in the limit of strong interguide coupling. Low-loss switching is predicted for cross-to-bar and bar-to-cross coupling lengths. These self-holding switches had active lengths of 500-1000 mu m, which are shorter than those in couplers relying upon free-carrier injection. The four-waveguide devices had lower cross talk but higher loss than the three-waveguide devices. For the crystalline phase we sometimes used an active length that was smaller than that for the amorphous phase. (C) 2015 Optical Society of America
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