Journal
SURFACE SCIENCE SPECTRA
Volume 22, Issue 2, Pages 7-13Publisher
AMER INST PHYSICS
DOI: 10.1116/1.4930928
Keywords
alumina; TOF-SIMS; cluster ion source; silicon; TLC
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Funding
- Diamond Analytics, a U.S. Synthetic company (Orem, UT)
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The authors report the positive and negative ion time-of-flight secondary ion mass spectrometry characterization of a thin film of e-beam evaporated alumina on a silicon substrate using Bi-3(++) primary ions at 50 keV, where this film prevents poisoning of a Fe catalyst in carbon nanotube growth. The positive ion spectrum showed a strong Al+ signal, while the negative ion spectrum showed strong peaks due to AlO-, AlO2-, AlO3H2-, and OH-. (C) 2015 American Vacuum Society.
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