Atomic-Layer Deposition into 2-versus 3-Dimensionally Ordered Nanoporous Media: Pore Size or Connectivity?

Atomic-layer deposition (ALD) is now being recognized as a powerful, general tool for modifying the surfaces of nanomaterials in applications for many energy conversion devices. However, ALD involves slow processes particularly when it is subjected to nanoporous media with high-aspect ratios. Predicting the exact experimental conditions of the desired reactions for coating inside deep pores by ALD is not available because of the lack of complete understanding of diffusion in nanoporous media. Here, we report a comparative study of the ALD coating onto two distinctive templates having nanopores, i.e., 2- and 3-dimensionally ordered media (DOM), of similar porosity and pore dimension. Self-supporting, crack-free templates were carefully prepared in centimeters for both 2- and 3-DOM and thus avoid any possible sources of uncontrollable diffusion of precursor gas molecules through unwanted microvoids and cracks. Comparison of the ALD coating profiles across the thickness of both templates reveals a fundamentally distinct coating mechanism. While a uniform growth zone develops along the pores of the 2-DOM (i.e., 1-D diffusion path), a gradual decrease in the deposition is observed in those of the 3-DOM (i.e., 3-D diffusion path) as ALD pulse time increases. This observation suggests an essential role of the pore connectivity, rather than individual pore sizes, in the gas diffusion dynamics inside nanoporous media. The present model can universally predict the ALD behaviors in nanoporous media even with different types of pore connectivity.