Journal
APPLIED SURFACE SCIENCE
Volume 435, Issue -, Pages 16-22Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2017.11.049
Keywords
Co-sputtering deposition; Multilayers; Self-assembly; Diffusion barrier
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Funding
- National Natural Science Foundation of China [51675169]
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Nano-multilayered film is usually prepared by the arrangement deposition of different materials. In this paper, a self-assembled nano-multilayered film was deposited by simultaneous sputtering of Cu and W. The Cu/W nano-multilayered film was accumulated by W-rich layer and Cu-rich layer. Smooth interfaces with consecutive composition variation and semi-coherent even coherent relationship were identified, indicating that a spinodal-like structure with a modulation wavelength of about 20 nm formed during co-deposition process. The participation of diffusion barrier element, such as W, is believed the essential to obtain the nano-multilayered structure besides the technological parameters. (c) 2017 Elsevier B.V. All rights reserved.
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