Journal
APPLIED PHYSICS LETTERS
Volume 112, Issue 10, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.5017094
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Funding
- JST-CREST [JPMJCR14F2]
- China Scholarship Council (CSC)
- Grants-in-Aid for Scientific Research [16K14225, 15J10995] Funding Source: KAKEN
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The ferroelectric properties of ultrathin Y-doped HfO2 films were investigated. Ferroelectricity was demonstrated experimentally in 3 nm-thick Y-doped HfO2 via direct detection of displacement currents during polarization switching. The dependence on the HfO2 thickness within the 30 to 3 nm range revealed that the ferroelectric properties decrease rapidly below a critical thickness. In the ultrathin HfO2 region, methods such as higher Y doping or metal capping annealing were required to further stabilize the ferroelectric phase. These methods could be used to enhance the switchable polarization (P-sw) to 35 mu C/cm(2) in 5 nm- and 10 mu C/cm(2) in 3 nm-thick Y-doped HfO2. This paper indicates that HfO2 ferroelectricity is scalable even in the ultrathin region. Published by AIP Publishing.
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