4.5 Article

Optimized pupil-plane phase masks for high-contrast imaging

Journal

APPLIED OPTICS
Volume 57, Issue 20, Pages 5688-5693

Publisher

OPTICAL SOC AMER
DOI: 10.1364/AO.57.005688

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Funding

  1. Office of Naval Research (ONR) [N000141612114, N0001416WX00022, N0001416WX00165, N0001417WX00024, N0001417WX00034]
  2. U.S. Department of Defense (DOD) [N000141612114] Funding Source: U.S. Department of Defense (DOD)

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A differential evolution algorithm (DEA) is shown to improve the design of phase-only pupil plane masks for imaging in the presence of a high-intensity point source. Strehl and suppression ratio metrics for various phase basis functions were experimentally and numerically calculated. Experiments performed with a spatial light modulator demonstrated 100 times suppression of the peak intensity. The Strehl ratio was found to be higher for the DEA masks compared to the individual phase basis function. (C) 2018 Optical Society of America

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