Nonlocal topological valley transport at large valley Hall angles

Berry curvature hot spots in two-dimensional materials with broken inversion symmetry are responsible for the existence of transverse valley currents, which give rise to giant nonlocal dc voltages. Recent experiments in high-quality gapped graphene have highlighted a saturation of the nonlocal resistance as a function of the longitudinal charge resistivity rho(c,xx,), when the system is driven deep into the insulating phase. The origin of this saturation is, to date, unclear. In this work we show that this behavior is fully compatible with bulk topological transport in the regime of large valley Hall angles (VHAs). We demonstrate that, for a fixed value of the valley diffusion length, the dependence of the nonlocal resistance on rho(c,xx,), weakens for increasing VHAs, transitioning from the standard rho(3)(c)(,xx,), power law to a result that is independent of rho(c,xx,).