Lithographically Defined Graphene Patterns

With the maturation and development of graphene synthesis and deposition, the next challenge is to produce graphene patterns to advance the practical applications of graphene in areas related to energy, the environment, sensors, and health care. In recent years, lithographically defined graphene patterns have arisen and received considerable attention. The patterns generated by lithographical methods exhibit greater positional accuracy, nanoscale features, and better uniformity, in addition to producing ready-to-use final devices. Here, recent lithographical nanofabrication methods for the preparation of graphene nanopatterns, such as graphene nanoribbons and graphene nanomeshes, and their applications are reviewed. Fabrication techniques for graphene patterning are discussed, including electron-beam lithography, nanoimprint lithography, nanosphere lithography, interferometric lithography, and ion beam lithography. Finally, future perspectives in the field are discussed.