Journal
OPEN PHYSICS
Volume 15, Issue 1, Pages 1067-1071Publisher
DE GRUYTER POLAND SP ZOO
DOI: 10.1515/phys-2017-0137
Keywords
photovoltaic; silicon solar cell; atomic layer deposition; antireflection coating
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- Faculty of Mechanical Engineering of the Silesian University of Technology
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This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical compositionwere also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.
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