Journal
JOURNAL OF MATERIALS CHEMISTRY C
Volume 5, Issue 22, Pages 5372-5377Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c7tc00449d
Keywords
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Funding
- National Key R&D Program of China [2016YFB0400700]
- Collaborative Innovation Centre of Suzhou Nano Science and Technology (Nano-CIC)
- Priority Academic Program Development of Jiangsu Higher Education Institutions (PAPD)
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For the purpose of fabricating solution-processed quantum-dot light-emitting diodes (QLEDs) with high performance, the efficient hole-electron recombination at low current density is particularly pivotal. Herein, to enhance the charge balance of the QLED device, we employed lithium bis(trifluoromethylsulfonyl) imide (Li-TFSI) as a p-type dopant into the hole-transporting material (HTM) of poly(9-vinlycarbazole) (PVK). In the experiment, the increased conductivity and the enhanced charge mobility of the Li-TFSI-doped PVK layer were confirmed by the J-V curves of the hole-only devices and conductive atomic force microscopy (c-AFM). Furthermore, on combining ultraviolet photoelectron spectroscopy (UPS) and the absorption spectra, it was found that the highest occupied molecular orbital (HOMO) of the Li-TFSI-doped PVK layers gradually shifted closer to the Fermi level upon increasing the doping ratios from 0 to 4.5 wt%. Therefore, the hole-injecting barrier decreases from 1.17 eV to 0.64 eV. As a result, the maximum current efficiency and the highest external quantum efficiency (EQE) of our fabricated QLED devices can reach as high as 15.5 cd A(-1) and 11.46%, respectively. It was demonstrated that the p-type dopant Li-TFSI in the HTM can contribute to the fabrication of high-performance solution-processed light-emitting diodes.
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