Journal
JOURNAL OF MATERIALS CHEMISTRY A
Volume 5, Issue 19, Pages 8946-8953Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c7ta01217a
Keywords
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Funding
- Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan [26620194, 26220911]
- MEXT program, Japan
- Grants-in-Aid for Scientific Research [16K14478, 26620194] Funding Source: KAKEN
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Well-crystallized, high-surface-area plasmonic MoO3-x was synthesized by combining an evaporation induced self-assembly (EISA) process and a subsequent hydrogen reduction at a certain temperature. The intrinsic anisotropic crystal growth process of tiny MoO3 nuclei to MoO3 nanosheets was successfully inhibited. Detailed characterization by means of XRD, TEM, N-2 physisorption, and XPS measurements revealed that the synthesized MoO3-x not only showed a strong localized surface plasmon resonance (LSPR) under incident light but also had a relatively large specific surface area. The specific surface area (S-BET) of MoO3-x after reduction at 200 degrees C was 30.0 m(2) g(-1), which was 22.7 and 9.1 times higher than those of commercially available MoO3 and our previously reported MoO3-x nanosheets, respectively. We also demonstrate that such a semiconductor with a large surface area could be used as a highly efficient catalyst that dramatically enhances the dehydrogenation activity for ammonia borane (NH3BH3; AB) under visible light irradiation.
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