4.6 Article

Tunneling field effect transistor integrated with black phosphorus-MoS2 junction and ion gel dielectric

Journal

APPLIED PHYSICS LETTERS
Volume 110, Issue 3, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4974303

Keywords

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Funding

  1. Global Frontier Program through the Global Frontier Hybrid Interface Materials (GFHIM) of the National Research Foundation of Korea (NRF) [2013M3A6B1078873]
  2. Pioneer Research Center Program through the National Research Foundation of Korea - Ministry of Science, ICT & Future Planning [2014M3C1A3053024]
  3. Basic Science Research Program through the National Research Foundation of Korea - Korean Government (MSIP) [2015R1D1A1A09057297, 2015M3A7B7045496]
  4. National Research Foundation of Korea [2015R1D1A1A09057297, 2013M3A6B1078873, 2014M3C1A3053029, 2015M3A7B7045496] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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We report an interband tunneling field effect transistor (TFET) integrated with a Black Phosphorus (BP)-MoS2 junction and ion gel as a top gate dielectric. The operation of the BP-MoS2 TFET is based on the modulation of the energy band alignment of the BP-MoS2 junction with electrostatic gating control on the MoS2 channel from the top gate through the ion gel dielectric and the supply of tunneling carriers from the BP source, which is degenerately doped with ion gel. The obtained subthreshold swing of the BP-MoS2 TFET reached 65 mV/dec at room temperature and 51 mV/dec at 160K, maintaining low SS values in more than 2 orders of drain current range. The demonstrated interband TFET based on the BP-MoS2 junction shows significant promise for further application to a new class of two-dimensional functional devices. Published by AIP Publishing.

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