Journal
CERAMICS INTERNATIONAL
Volume 43, Issue 2, Pages 1768-1774Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2016.10.122
Keywords
NiS; NiS-sensitized TiO2 film; Carbon dioxide photoreduction; Methane production
Categories
Funding
- Ceramic Fiber Commercial Center Project of Korea Institute of Ceramic Engineering & Technology (KICET) - Ministry of Trade, Industry Energy (MOTIE)
- Basic Science Research Program through National Research Foundation of Korea (NRF) - Ministry of the Science ICT & Future Planning [2015R1A1A3A04001268]
- National Research Foundation of Korea [2015R1A1A3A04001268] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Ask authors/readers for more resources
Nanoparticles of the p-type semiconductor nickel sulfide are grown on a highly aligned n-type TiO2 film. Using XRD, XPS, EDS, UV-Vis diffuse reflectance spectroscopy, photoluminescence, photocurrent density, and CO2-TPD, the physicochemical characteristics of the p-n heterojunction NiS-sensitized TiO2 films are investigated. The highest photocurrent is obtained for the optimized 0.10 M NiS-sensitized TiO2 film, which resulted in eventually decreasing the electron-hole recombination during CO2 photoreduction. The NiS-sensitized TiO2 film exhibits superior photocatalytic behavior compared to that of a pure TiO2 film. A model for investigating the catalytic activity of the NiS-sensitized TiO2 film for CO2 photoreduction is proposed.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
