Journal
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
Volume 56, Issue 6, Pages 1648-1652Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/anie.201611559
Keywords
area-selective atomic layer deposition; Co3O4 nanotraps; Pt nanoparticles; room-temperature CO oxidation; thermal stability
Categories
Funding
- National Basic Research Program of China [2013CB934800]
- National Natural Science Foundation of China [51575217, 51572097]
- Analytic Testing Center and Flexible Electronics Research Center of HUST
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An area-selective atomic layer deposition (AS-ALD) method is described to construct oxide nanotraps to anchor Pt nanoparticles (NPs) on Al2O3 supports. The as-synthesized catalysts have exhibited outstanding room-temperature CO oxidation activity, with a significantly lowered apparent activation energy (ca. 22.17kJmol(-1)) that is half that of pure Pt catalyst with the same loading. Furthermore, the structure shows excellent sintering resistance with the high catalytic activity retention up to 600 degrees C calcination. The key feature of the oxide nanotraps lies in its ability to anchor PtNPs via strong metal-oxide interactions while still leaving active metal facets exposed. Our reported method for forming such oxide structure with nanotraps shows great potential for the simultaneous enhancement of thermal stability and activity of precious metal NPs.
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