The influence of tertiary butyl hydrazine as a co-reactant on the atomic layer deposition of silver

Ultra-thin conformal silver films are the focus of development for applications such as anti-microbial surfaces, optical components and electronic devices. In this study, metallic silver films have been deposited using direct liquid injection thermal atomic layer deposition (ALD) using (hfac)Ag(1,5-COD) ((hexafluoroacetylacetonato)silver(I)(1,5-cyclooctadiene)) as the metal source and tertiary butyl hydrazine (TBH) as a co-reactant. The process provides a 23 degrees C wide 'self-limiting' ALD temperature window between 105 and 128 degrees C, which is significantly wider than is achievable using alcohol as a co-reactant. A mass deposition rate of similar to 20 ng/cm(2)/cycle (similar to 0.18 angstrom/cycle) is observed under self-limiting growth conditions. The resulting films are crystalline metallic silver with a near planar film-like morphology which are electrically conductive. By extending the temperature range of the ALD window by the use of TBH as a co-reactant, it is envisaged that the process will be exploitable in a range of new low temperature applications. (C) 2016 The Authors. Published by Elsevier B.V.