4.6 Article

Deterministic patterned growth of high-mobility large-crystal graphene: a path towards wafer scale integration

Journal

2D MATERIALS
Volume 4, Issue 2, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/2053-1583/aa5481

Keywords

graphene; CVD; high-mobility; wafer scale integration; seeded growth

Funding

  1. European Union [696656-GrapheneCore1]
  2. Regione Toscana 'Bando Sostegno alle Infrastrutture di Ricerca' [6455]

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We demonstrate rapid deterministic (seeded) growth of large single-crystals of graphene by chemical vapour deposition (CVD) utilising pre-patterned copper substrates with chromium nucleation sites. Arrays of graphene single-crystals as large as several hundred microns are grown with a periodicity of up to 1 mm. The graphene is transferred to target substrates using aligned and contamination-free semi-dry transfer. The high quality of the synthesised graphene is confirmed by Raman spectroscopy and transport measurements, demonstrating room-temperature carrier mobility of 21 000 cm(2) V-1 s(-1) when transferred on top of hexagonal boron nitride. By tailoring the nucleation of large single-crystals according to the desired device geometry, it will be possible to produce complex device architectures based on single-crystal graphene, thus paving the way to the adoption of CVD graphene in wafer-scale fabrication.

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