Journal
CHEMISTRY OF MATERIALS
Volume 29, Issue 4, Pages 1587-1598Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acs.chemmater.6b04467
Keywords
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Funding
- Ministry of Science and Technology [105-3113-E-007-003-CC2, 104-2628-M-007-004-MY3, 104-2221-E-007-048-MY3, 105-2633-M-007-003, 104-2622-M-007-002-CC2]
- National Tsing Hua University [105A0088J4]
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An inductively coupled plasma (ICP) process was used to synthesize transition metal dichalcogenides (TMDs) through a plasma-assisted selenization process of metal oxide (MOx) at a temperature as low as 250 degrees C. In comparison with other CVD processes, the use of ICP facilitates the decomposition of the precursors at low temperatures. Therefore, the temperature required for the formation of TMDs can be drastically reduced. WSe2 was chosen as a model material system due to its technological importance as a p-type inorganic semiconductor with an excellent hole mobility. Large-area synthesis of WSe2 on polyimide (30 x 40 cm(2)) flexible substrates and 8 in. silicon wafers with good uniformity was demonstrated at the formation temperature of 250 degrees C confirmed by Raman and X-ray photoelectron (XPS) spectroscopy. Furthermore, by controlling different H-2/N-2 ratios, hybrid WOx/WSe2 films can be formed at the formation temperature of 250 degrees C confirmed by TEM and XPS. Remarkably, hybrid films composed of partially reduced WOx and small domains of WSe2 with a thickness of similar to 5 nm show a sensitivity of 20% at 25 ppb at room temperature, and an estimated detection limit of 0.3 ppb with a S/N > 10 for the potential development of a low-cost plastic/wearable sensor with high sensitivity.
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