4.7 Article

Electronic Structure of the Metastable Epitaxial Rock-Salt SnSe {111} Topological Crystalline Insulator

Journal

PHYSICAL REVIEW X
Volume 7, Issue 4, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevX.7.041020

Keywords

-

Funding

  1. U.S. Department of Energy, Office of Basic Energy Sciences [DE-SC0012704]
  2. National Science Foundation (NSF) EFRI-2DARE [1433490]
  3. NSF [DMR 1400432, DMR 1006863]
  4. NSF MRSEC [DMR-1120296]
  5. U.S. Department of Energy [DE-FG 02-04-ER-46157]
  6. National Natural Science Foundation of China [11274381, 11474340, 11234014]
  7. Ministry of Science and Technology of China [2015CB921300, 2013CB921700]
  8. Chinese Academy of Sciences [XDB07000000]
  9. [DMR-1408838]
  10. [DMR-1506119]
  11. Directorate For Engineering
  12. Emerging Frontiers & Multidisciplinary Activities [1433490] Funding Source: National Science Foundation

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Topological crystalline insulators have been recently predicted and observed in rock-salt structure SnSe {111} thin films. Previous studies have suggested that the Se-terminated surface of this thin film with hydrogen passivation has a reduced surface energy and is thus a preferred configuration. In this paper, synchrotron-based angle-resolved photoemission spectroscopy, along with density functional theory calculations, is used to demonstrate that a rock-salt SnSe {111} thin film epitaxially grown on Bi2Se3 has a stable Sn-terminated surface. These observations are supported by low-energy electron diffraction (LEED) intensity-voltage measurements and dynamical LEED calculations, which further show that the Sn-terminated SnSe {111} thin film has undergone a surface structural relaxation of the interlayer spacing between the Sn and Se atomic planes. In sharp contrast to the Se-terminated counterpart, the observed Dirac surface state in the Sn-terminated SnSe {111} thin film is shown to yield a high Fermi velocity, 0.50 x 10(6) m/s, which suggests a potential mechanism of engineering the Dirac surface state of topological materials by tuning the surface configuration.

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