4.8 Article

Atomic Layer Deposition on 2D Materials

Journal

CHEMISTRY OF MATERIALS
Volume 29, Issue 9, Pages 3809-3826

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.chemmater.6b05103

Keywords

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Funding

  1. Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [2016R1D1A1B03935611]
  2. National Research Foundation of Korea [2016R1D1A1B03935611] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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2D materials are layered crystalline materials and are the most attractive nanomaterials due to their potentials in next-generation electronics. Because most 2D materials are atomically thin, a suitable fabrication process without degradation of the original properties of the material is required to realize 2D-material-based devices. Atomic layer deposition (ALD) is an ideal technique for adding materials with atomic scaling precision to nanomaterials. Due to the surface-sensitive reactions of ALD, growth on 2D materials is strongly affected by the surface properties of the 2D materials. In this Perspective, ALD growth on 2D materials is reviewed and discussed with previously reported results to provide insights to readers who are investigating 2D materials and relevant topics.

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