4.7 Article

Direct Laser Interference Patterning of CoCr Alloy Surfaces to Control Endothelial Cell and Platelet Response for Cardiovascular Applications

Journal

ADVANCED HEALTHCARE MATERIALS
Volume 6, Issue 19, Pages -

Publisher

WILEY
DOI: 10.1002/adhm.201700327

Keywords

CoCr; direct laser interference patterning; endothelial cells; linear surface pattern; platelets

Funding

  1. Spanish Government [MAT2015-67183-R]
  2. Agency for Administration of University and Research Grants of the Government of Catalonia [2014 SGR 1333]
  3. Health Institute Carlos III (ISCIII) [DTS16/00133]
  4. Erasmus Mundus Doctoral Programme DocMASE of the European Commission [FPA 2011-0020]
  5. Generalitat de Catalunya

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The main drawbacks of cardiovascular bare-metal stents (BMS) are in-stent restenosis and stent thrombosis as a result of an incomplete endothelialization after stent implantation. Nano- and microscale modification of implant surfaces is a strategy to recover the functionality of the artery by stimulating and guiding molecular and biological processes at the implant/tissue interface. In this study, cobalt-chromium (CoCr) alloy surfaces are modified via direct laser interference patterning (DLIP) in order to create linear patterning onto CoCr surfaces with different periodicities (approximate to 3, 10, 20, and 32 mu m) and depths (approximate to 20 and 800 nm). Changes in surface topography, chemistry, and wettability are thoroughly characterized before and after modification. Human umbilical vein endothelial cells' adhesion and spreading are similar for all patterned and plain CoCr surfaces. Moreover, high-depth series induce cell elongation, alignment, and migration along the patterned lines. Platelet adhesion and aggregation decrease in all patterned surfaces compared to CoCr control, which is associated with changes in wettability and oxide layer characteristics. Cellular studies provide evidence of the potential of DLIP topographies to foster endothelialization without enhancement of platelet adhesion, which will be of high importance when designing new BMS in the future.

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