4.5 Article

High-Surface Area Ceria-Zirconia Films Prepared by Atomic Layer Deposition

Journal

CATALYSIS LETTERS
Volume 147, Issue 6, Pages 1464-1470

Publisher

SPRINGER
DOI: 10.1007/s10562-017-2053-1

Keywords

Ceria-zirconia; Thermal stability; High-surface area; Atomic layer deposition; CO Oxidation

Funding

  1. Department of Energy, Office of Basic Energy Sciences, Chemical Sciences, Geosciences and Biosciences Division [DE-FG02-13ER16380]

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Ceria-zirconia, solid solutions were prepared as thin, dense films on a 130-m(2)/g gamma-Al2O3 by Atomic Layer Deposition (ALD) for use as catalyst supports. Ce0.5Zr0.5O2 solid solutions were grown by alternating between Ce(TMHD)(4) and Zr(TMHD)(4) precursors during ALD cycles. 50 precursor-oxidation cycles resulted in a material with 0.77 g Ce0.5Zr0.5O2 per g gamma-Al2O3, corresponding to an average film thickness of 1.0 nm. The lattice parameter obtained from XRD was consistent with formation of a solid solution and scanning transmission electron microscopy (STEM) showed the mixed oxide was uniformly deposited. When impregnated with 1-wt% Pd, the ALD-prepared Ce0.5Zr0.5O2-gamma-Al2O3 catalyst showed CO-oxidation activity similar to Pd on bulk Ce0.5Zr0.5O2; however, the ALD-prepared sample maintained much of its surface area and catalytic activity when heated to temperatures up to 1273 K.

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