4.7 Article

Freestanding nanostructures via reactive ion beam angled etching

Journal

APL PHOTONICS
Volume 2, Issue 5, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4982603

Keywords

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Funding

  1. National Science Foundation under NSF [1541959]
  2. Air Force Office of Scientific Research (MURI) [FA9550-14-1-0389]
  3. Defense Advanced Research Projects Agency (DARPA) [W31P4Q15-1-0013]
  4. STC Center for Integrated Quantum Materials
  5. NSF GOALI [1507508]
  6. National Science Foundation Graduate Research Fellowship [DGE1144152]
  7. NSF [DMR-1231319]
  8. Directorate For Engineering
  9. Div Of Electrical, Commun & Cyber Sys [1507508] Funding Source: National Science Foundation

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Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk polycrystalline and single crystal diamond. Reported quality factors are approximately 30 000 and 286 000, respectively. The devices show uniformity across 25 mm samples, a significant improvement over comparable techniques yielding freestanding nanostructures. (C) 2017 Author(s).

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