Journal
OPTICAL MATERIALS EXPRESS
Volume 7, Issue 10, Pages 3706-3714Publisher
OPTICAL SOC AMER
DOI: 10.1364/OME.7.003706
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Funding
- European Union EFRE program (ProFIT grant) [10160255, 10160265, 10160256]
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Thin films with vanishing real part of the dielectric function (Re[epsilon] = 0) in the midinfrared (MIR) region are promising photonic materials for manipulating and enhancing IR light-matter interactions at the nanoscale. We present a nanospectroscopic characterization of two fundamental polaritonic phenomena near Re[epsilon] = 0 by atomic force microscope infrared spectroscopy (AFM-IR): the Berreman mode (BE) in 100 nm SiO2 and Si3N4 films on Si, and epsilon-near-zero (ENZ) local field confinement in a 2 nm native SiO2 layer on Si. AFM-IR is an emerging photothermal technique that provides direct information on nanoscale IR absorption, allowing unambiguous identification of BE and ENZ effects supported by simulations. We demonstrate far-field applicability of polaritonic AFM-IR studies by characterizing a nanoscale plasmonic ENZ grating on Si with 2 nm native SiO2 using polarization-dependent IR microscopy. (C) 2017 Optical Society of America
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