4.6 Article

Identifying a doping type of semiconductor nanowires by photoassisted kelvin probe force microscopy as exemplified for GaN nanowires

Journal

OPTICAL MATERIALS EXPRESS
Volume 7, Issue 3, Pages 904-912

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OME.7.000904

Keywords

-

Funding

  1. National Key Research and Development Program of China [2016YFB0400100]
  2. National Natural Science Foundation of China [61225019, 61376060, 61428401, 61521004]
  3. Science Challenge Project [JCKY2016212A503]
  4. NSAF [U1630109]
  5. CAEP Microsystem and THz Science and Technology Foundation [CAEPMT201507]
  6. Open Fund of the State Key Laboratory on Integrated Optoelectronics

Ask authors/readers for more resources

It remains a challenge to characterize the doping type in nanowires (NWs). We report in this paper a novel way to probe the doping type in GaN NWs by photoassisted kelvin probe force microscopy (KPFM), as a proper example showing that this approach is straight forward, effective and practical. Through illumination with super-bandgap light, photo-generated electrons in the n-region are swept away from the surface due to the electric field in the space-charge region, thus the holes move to the surface; while in contrast, electrons in the p-region will move to the surface. The fact that the quasi-Fermi level moves upwards in n-type while downwards in p-type identifies the doping type of GaN NWs, and is clearly revealed by the contact potential difference detected by photoassisted KPFM. (C) 2017 Optical Society of America

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available