4.6 Article

Unidirectional threshold resistive switching in Au/NiO/Nb:SrTiO3 devices

Journal

APPLIED PHYSICS LETTERS
Volume 110, Issue 23, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4985070

Keywords

-

Funding

  1. 973 project of the Ministry of Science and Technology of China [2015CB921402]
  2. National Science Foundation of China [51572150, 11134007]
  3. China Scholarship Council (CSC) [201506210144]

Ask authors/readers for more resources

A voltage-induced unidirectional threshold resistive switching has been reported for Au/NiO/Nb: SrTiO3 devices fabricated by pulsed laser deposition. The devices show the threshold resistive switching behavior only for the positive voltages, determined by the forming process. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the as-grown samples with different thicknesses suggest that the I-V and C-V properties are dominated by the Schottky junction at the NiO/Nb: SrTiO3 interface and NiO film, respectively, indicating the formation of conductive filaments in NiO film. Furthermore, the effect of NiO-film thickness on the resistive switching, as well as the I-V and C-V characteristics, indicates that the unidirectional threshold resistive switching originates from the combined contributions of the interfacial Schottky junction modulation and the bipolar threshold switching related to the unstable conductive filament in NiO film. Our research results provide additional insights into the resistive switching mechanism as well as applications of selector device. Published by AIP Publishing.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available