Journal
APPLIED PHYSICS EXPRESS
Volume 10, Issue 7, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/APEX.10.076502
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Funding
- JSPS [16K04920]
- JSPS Bilateral Joint Research Projects in Belgium, Toyama Nanotech Cluster (Regional Innovation Strategy Support Program in Toyama)
- Nanotechnology Platform Project (Nanotechnology Open Facilities in Osaka University) of the Ministry of Education, Culture, Sports, Science and Technology, Japan
- Canon Foundation
- Die and Mould Technology Promotion Foundation
- Amada Foundation
- Grants-in-Aid for Scientific Research [16K04920, 25246036] Funding Source: KAKEN
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From the viewpoints of the utilization of agricultural resources and advanced use of biomass, this study is aimed at expanding the resolution limits of ecofriendly ethanol-developable processes for electron-beam lithography using a positive-tone dextrin resist material with high hydrophilicity on a cellulose-based underlayer. The images of 20-nm-hole and 40-nm-line patterns with an exposure dose of approximately 1800 mu C/cm(2) were provided by ecofriendly ethanol-developable processes instead of the common development processes using tetramethylammonium hydroxide and organic solvents. The CF4 etching selectivity of the positive-tone dextrin resist material was approximately 10% lower than that of the polymethyl methacrylate used as a reference resist material.(C) 2017 The Japan Society of Applied Physics
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