Journal
JOURNAL OF OPTICS
Volume 19, Issue 9, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/2040-8986/aa7c7d
Keywords
photolithography; plasmonics; interference lithography; diffraction grating; genetic algorithm; evanescent fields
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Funding
- MacDiarmid Institute for Advanced Materials and Nanotechnology
- Marsden Fund of New Zealand (RSNZ) [UOO1214]
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Grating coupled near-field interference lithography has the ability to produce deep-subwavelength interference patterns. Simulations of these systems is very computationally intensive. An inverse design procedure employing a genetic algorithm is utilized here to massively reduce the computational load and allow for the design of systems capable of interfering extremely high numerical apertures. This method is used to optimize systems with an interference patterns with a half pitch of lambda/40 corresponding to a numerical aperture of 20. It is also used to demonstrate interference of higher |m| diffraction orders.
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