4.8 Article

a-Axis GaN/AlN/AlGaN Core-Shell Heterojunction Microwires as Normally Off High Electron Mobility Transistors

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 9, Issue 47, Pages 41435-41442

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.7b12986

Keywords

GaN microwire; GaN/AlN/AlGaN; heterojunction; electron gas; normally off; HEMT

Funding

  1. National Natural Science Foundation of China [11474105, 61404156]
  2. Science and Technology Program of Guangdong Province, China [2015B090903078, 2015B010105011]
  3. Science and Technology Project of Guangzhou City [201607010246]
  4. Innovation Project of Graduate School of South China Normal University
  5. Program for Changjiang Scholars and Innovative Research Team in Universities of China [IRT13064]

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Micro/nanowire-based devices have been envisioned as a promising new route toward improved electronic and optoelectronic applications, which attracts considerable research interests. However, suffering from applicable strategies to synthesize uniform core-shell structures to meet the requirement for the investigations of electrical transport behaviors along the length direction or high electron mobility transistor (HEMT) devices, heterojunction wire based electronics have been explored limitedly. In the present work, GaN/AlN/AlGaN core-shell heterojunction microwires on patterned Si substrates were synthesized without any catalyst via metalorganic chemical vapor deposition. The as-synthesized microwires had low dislocation, sharp, and uniform heterojunction interfaces. Electrical transport performances were evaluated by fabricating HEMTs on the heterojunction microwire channels. Results demonstrated that a normally off operation was achieved with a threshold voltage of 1.4 V, a high on/off current ratio of 10(8), a transconductance of 165 mS/mm, and a low subthreshold swing of 81 mV/dec. The normally off operation may attribute to the weak polarization along semipolar facets of the heterojunction, which leads to weak constrain of 2DEG.

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