Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 30, Pages 16138-16142Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b04043
Keywords
atomic layer deposition; quartz crystal microbalance; in situ; iron oxide; hematite; iron bisamidinate
Funding
- ANSER Center, an Energy Frontier Research Center - U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-SC0001059]
- MRSEC program of the National Science Foundation at the Materials Research Center of Northwestern University [DMR-1121262]
- Swiss National Science Foundation
- Early Postdoc Mobility Fellowship
- NSF-NSEC
- NSF-MRSEC
- KECK Foundation
- State of Illinois
- Northwestern University
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Atomic layer deposition (ALD) has been shown to be an excellent Method for depositing thin films, of iron oxide. With limited iron precursors available; the methods widely used require harsh Conditions such as high temperatures and/or the use of oxidants such as ozone Or peroxide. This letter aims to show that bis(N,N'-di-t-butylacetamidinato) iron(II) (iron bisamidinate or FeAMD) is an ideal ALD precursor because of it'S reactivity with water and relative,volatility. Using, in situ QCM,analysis, we show outstanding conformal self-limiting growth of FeOx using FeAMD and water at temperatures lower than 200 degrees C. By annealing thin films of FeOx at 500 degrees C, we observe the formation of alpha-Fe2O3, confirming that we can Use FeAMD to fabricate thin films of catalytically promising iron oxide materials using moderate growth conditions.
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