4.4 Article

Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate

Journal

THIN SOLID FILMS
Volume 636, Issue -, Pages 48-53

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2017.05.033

Keywords

-

Funding

  1. Centre National de la Recherche Scientifique (CNRS) [ANR-13-IS09-0003-01]
  2. Romanian Ministry of Education and Scientific Research [PN-II-ID-JRP-2012-RO-FR-0161]

Ask authors/readers for more resources

Ta3N5 is a promising candidate for a variety of applications, most notably as a photoactive material for solar water splitting. It is typically synthesized in a two-step process in which oxidized tantalum is annealed in NH3. Magnetron sputtering is an alternative synthesis method that is little explored to date, as first tries resulted in a small degree of crystallinity of the samples. In this paper, we report on the addition of an axial magnetic field to the conventional magnetron configuration which guides ionic species from the negative glow onto the growing film of Ta3N5. This ion-assisted growth is shown to result in a high degree of crystallinity, i.e. amorphous content, which is typical for conventionally sputtered films, is largely suppressed. The surface of such prepared films is nano-structured by a dense population of grains. (C) 2017 Elsevier B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available