Journal
METHODSX
Volume 4, Issue -, Pages 229-242Publisher
ELSEVIER
DOI: 10.1016/j.mex.2017.07.001
Keywords
Microsphere lithography; Plasmonic; Nanosphere lithography; Dip coating; Spin coating; Nanosphere; Plasmonic; Metamaterial; Photovoltaic; Synthesis
Categories
Funding
- National Science Foundation [CBET-1235750]
- SPIE Optics and Photonics Education Scholarship
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Recent advances in the use of plasmonic metamaterials to improve absorption of light in thin-film solar photovoltaic devices has created a demand for a scalable method of patterning large areas with metal nanostructures deposited in an ordered array. This article describes two methods of fabricating ordered 2D nanosphere colloidal films: spin coating and interface coating. The two methods are compared and parameter optimization discussed. The study reveals that: For smaller nanosphere sizes, spin coating is more favorable, while for larger nanospheres, the angled interface coating provides more coverage and uniformity. A surfactant-free approach for interface coating is developed to fabricate zero-contamination colloidal films. Each of the methods reaches an overall coverage of more than 90% and can be used for nanosphere lithography to form plasmonic metamaterials. (c) 2017 The Author(s). Published by Elsevier B.V.
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